MOCVD growth of TiO2 thin films on single crystal GaAs substrates
- 1 June 2000
- journal article
- Published by Elsevier in International Journal of Inorganic Materials
- Vol. 2 (2-3) , 255-259
- https://doi.org/10.1016/s1466-6049(99)00061-6
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
- SEM and XPS studies of titanium dioxide thin films grown by MOCVDThin Solid Films, 1998
- Study by XPS of ultra-thin nickel deposits on TiO2(100) supports with different stoichiometriesSurface Science, 1995
- Hydrothermal epitaxy of highly oriented TiO2 thin films on siliconApplied Physics Letters, 1995
- Formation and Characterization of Epitaxial TiO2 and BaTiO3/TiO2 Films on Si SubstrateJapanese Journal of Applied Physics, 1995
- Low Temperature Preparation of TiO2 Thin Films by Plasma-Enhanced Chemical Vapor DepositionJournal of the Ceramic Society of Japan, 1993
- Rapid formation of TiO2 films by a conventional CVD methodJournal of Materials Science Letters, 1990