Silicide Formation By High Dose Transition Metal Implants Into Si.
- 1 January 1985
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Nuclear resonance profiling of high dose implants of Al in SiNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1985
- Study of Near Surface Structure and Composition for High Dose Implantation of Cr+ into SiMRS Proceedings, 1983
- Thin Films—Interdiffusion and ReactionsJournal of the Electrochemical Society, 1979
- Limits of composition achievable by ion implantationJournal of Vacuum Science and Technology, 1978
- Iron silicide thin film formation at low temperaturesThin Solid Films, 1975