Chemically etched micromirrors in silicon
- 7 March 1988
- journal article
- conference paper
- Published by AIP Publishing in Applied Physics Letters
- Vol. 52 (10) , 836-837
- https://doi.org/10.1063/1.99300
Abstract
Purposely introduced pinholes can be processed so as to produce nearly spherical or paraboloidal depressions in (100) silicon by a two‐step chemical etching procedure in KOH:water solutions. Regular arrays of f/1–f/10 specularly reflecting micromirrors can be fabricated.Keywords
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