Patterned quantum dot molecule laser fabricated by electron beam lithography and wet chemical etching
- 1 January 2010
- proceedings article
- Published by Institute of Electrical and Electronics Engineers (IEEE)
Abstract
This study demonstrates the use of electronically coupled patterned quantum dots (QDs) fabricated using a wet-etching technique as the gain medium of a photonic device. This technique provides the unique ability to control both the spatial and spectral properties of QDs, while maintaining the high optical quality of the material necessary for photonics applications.Keywords
This publication has 4 references indexed in Scilit:
- High density patterned quantum dot arrays fabricated by electron beam lithography and wet chemical etchingApplied Physics Letters, 2008
- Optical Signatures of Coupled Quantum DotsScience, 2006
- InAs Quantum Dot Lasers with Extremely Low Threshold Current Density (7 A/cm2/Layer)Japanese Journal of Applied Physics, 2005
- Study of GaAs spacer layers in InAs/GaAs vertically aligned quantum dot structuresThin Solid Films, 2000