A TaSix barrier for low resistivity and high reliability of contacts to shallow diffusion regions in silicon
- 26 October 1984
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 120 (4) , 257-266
- https://doi.org/10.1016/0040-6090(84)90240-2
Abstract
No abstract availableKeywords
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