Models for interpreting deposition rate data from a closed chemical vapour deposition system
- 31 May 1980
- journal article
- Published by Elsevier in Journal of the Less Common Metals
- Vol. 71 (1) , 15-32
- https://doi.org/10.1016/0022-5088(80)90097-1
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Deposition rate and rate-limiting steps in the chemical vapour deposition of boron in a closed systemJournal of the Less Common Metals, 1980
- Mass Transfer, Equilibrium, and Kinetics in the Chemical Vapor Deposition of Boron from Impinging JetsJournal of the Electrochemical Society, 1977
- Thermodynamic Studies of High Temperature Equilibria. III. SOLGAS, a Computer Program for Calculating the Composition and Heat Condition of an Equilibrium Mixture.Acta Chemica Scandinavica, 1971
- Mass Transfer (Absorption) Coefficients Prediction from Data on Heat Transfer and Fluid FrictionIndustrial & Engineering Chemistry, 1934