Deposition rate and rate-limiting steps in the chemical vapour deposition of boron in a closed system
- 31 May 1980
- journal article
- Published by Elsevier in Journal of the Less Common Metals
- Vol. 71 (1) , 1-14
- https://doi.org/10.1016/0022-5088(80)90096-x
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Models for interpreting deposition rate data from a closed chemical vapour deposition systemJournal of the Less Common Metals, 1980
- Factors influencing the morphologies of boron deposited by chemical vapour depositionJournal of the Less Common Metals, 1980
- Mass Transfer, Equilibrium, and Kinetics in the Chemical Vapor Deposition of Boron from Impinging JetsJournal of the Electrochemical Society, 1977
- Bildung der gitter des reinen borsJournal of the Less Common Metals, 1971
- The structure analysis of β-rhombohedral boronJournal of Solid State Chemistry, 1970