A Metal Doping Effect in an Electron Beam Sensitive Resist
- 1 October 1981
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 20 (10) , 1969-1970
- https://doi.org/10.1143/jjap.20.1969
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Polymeric Resists for X-Ray LithographyJournal of the Electrochemical Society, 1974
- A New Family of Positive Electron Beam Resists—Poly(Olefin Sulfones)Journal of the Electrochemical Society, 1973
- The Monte Carlo technique as applied to the fundamentals of EPMA and SEMJournal of Applied Physics, 1972