Plasma-induced deposition of titanium nitride from TiCl4 in a direct current glow discharge: Control of the chlorine content and gas-phase nucleation
- 1 September 1996
- journal article
- Published by Springer Nature in Plasma Chemistry and Plasma Processing
- Vol. 16 (3) , 341-363
- https://doi.org/10.1007/bf01447150
Abstract
No abstract availableKeywords
This publication has 38 references indexed in Scilit:
- In Situ Xps Studies of the Deposition of Thin Films from Tetrakis(Dimethylamido)Titaniumorganometaluc Precursor for Diffusion BarriersMRS Proceedings, 1993
- Method for complex X-ray diffraction analysis of TiN coatingsCrystal Research and Technology, 1987
- The color of TiN and HfN: Aging effectsJournal of Vacuum Science & Technology A, 1986
- Neue Entwicklungen zur Herstellung von Hartstoffschichten mittles Plasma‐CVDMaterialwissenschaft und Werkstofftechnik, 1986
- Deposition of Titanilum Nitride Thin Films by Plasma Enhanced CVD and Reactive SputteringMRS Proceedings, 1986
- The Role of Low-Energy Ion/Surface Interactions During Crystal Growth From the Vapor PhaseMRS Proceedings, 1986
- Plasma-induced and plasma-assisted chemical vapour depositionThin Solid Films, 1985
- Plasma chemical vapor deposition of TiNPlasma Chemistry and Plasma Processing, 1984
- TiN coatings on steelThin Solid Films, 1981
- Influence of substrate temperature and deposition rate on structure of thick sputtered Cu coatingsJournal of Vacuum Science and Technology, 1975