A comparison of the step coverage of aluminum coatings produced by two sputter magnetron systems and a dual-beam ion system
- 1 December 1988
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 166, 45-54
- https://doi.org/10.1016/0040-6090(88)90365-3
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
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- Planar Deposition of Aluminum by RF/DC Sputtering with RF BiasJournal of the Electrochemical Society, 1985