A new approach to ion implanter mass analysis optics
- 1 November 1986
- Vol. 36 (11-12) , 953-960
- https://doi.org/10.1016/0042-207x(86)90147-8
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- The performance of the series III 200kv high current industrial ion implanterRadiation Effects, 1979
- The design philosophy for a 200 kV industrial high current ion implanterNuclear Instruments and Methods, 1976
- A new ion source for electromagnetic isotope separatorsNuclear Instruments and Methods, 1963