Transport and Structural Properties of VO2 Films
- 15 January 1972
- journal article
- conference paper
- Published by AIP Publishing in Applied Physics Letters
- Vol. 20 (2) , 93-95
- https://doi.org/10.1063/1.1654062
Abstract
Transport properties of sputtered VO2 films are shown to be critically dependent on the defect structure of this material. Measured values of thermoelectric power and Hall mobility for films deposited under optimum conditions are comparable to those previously measured on single crystals.Keywords
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