Fixed pattern noise in the solid-state imagers due to the striations in Czochralski silicon crystals
- 15 February 1985
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 57 (4) , 1369-1372
- https://doi.org/10.1063/1.334488
Abstract
The concentric circle pattern of growth striations in Czochralski (CZ) silicon wafer has been found to cause the fixed pattern noise in the reproduced image by solid-state imagers with the p-well structure. The microgrowth striations of dopant impurities in 4-in. n-type CZ silicon wafers have been examined in terms of noise video signals of p-well Charge Priming Device imagers. Striation periods as narrow as 10 μm can be revealed, which may be overlooked by the conventional spreading resistance method.This publication has 7 references indexed in Scilit:
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