Dependence of segregated microstructure in sputter-deposited CoCr film on deposition conditions
- 1 September 1987
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Magnetics
- Vol. 23 (5) , 2064-2066
- https://doi.org/10.1109/tmag.1987.1065612
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
- TEM Observation of Segregated Microstructure in Sputtered Co–Cr FilmJapanese Journal of Applied Physics, 1986
- TEM Observation of Microstructure in Sputtered Co-Cr FilmJapanese Journal of Applied Physics, 1985
- Perpendicular anisotropy constants and anisotropy energy of oriented cobalt-chromium alloysIEEE Transactions on Magnetics, 1984
- The magnetic and microstructural properties of Co-Cr thin films with perpendicular anisotropyJournal of Magnetism and Magnetic Materials, 1983
- Perpendicular magnetic anisotropy and microstructure of sputter-deposited Co-Cr filmJournal of Magnetism and Magnetic Materials, 1983
- R.f.-sputtered Co-Cr layers for perpendicular magnetic recording I: Structural propertiesThin Solid Films, 1983