Determination of the electronic density of states in hydrogenated amorphous silicon (a-SiH) from Schottky diode capacitance-voltage and conductance-voltage measurements
- 29 February 1980
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 35-36, 569-574
- https://doi.org/10.1016/0022-3093(80)90655-9
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Diodes Schottky et MIS tunnel sur silicium amorphe hydrogéné de qualité photovoltaïque préparé par pulvérisation cathodique Caractérisation électrique par mesures capacitivesRevue de Physique Appliquée, 1979
- An investigation of the amorphous-silicon barrier and p-n junctionPhilosophical Magazine Part B, 1978
- Preparation of highly photoconductive amorphous silicon by rf sputteringSolid State Communications, 1977
- Characterization of multiple deep level systems in semiconductor junctions by admittance measurementsSolid-State Electronics, 1974
- The Si-SiO2Interface - Electrical Properties as Determined by the Metal-Insulator-Silicon Conductance TechniqueBell System Technical Journal, 1967