Bulk electromigration and contact interface electromigration and conditions for eliminating both mechanisms in SiO2-covered aluminum lines
- 1 October 1987
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 30 (10) , 1069-1075
- https://doi.org/10.1016/0038-1101(87)90101-8
Abstract
No abstract availableKeywords
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