Self-aligned (top and bottom) double-gate MOSFET with a 25 nm thick silicon channel
- 22 November 2002
- proceedings article
- Published by Institute of Electrical and Electronics Engineers (IEEE)
- p. 427-430
- https://doi.org/10.1109/iedm.1997.650416
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
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