Laser plasma x-ray sources for microlithography

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Abstract
A plasma produced by laser irradiation of solid targets is a promising candidate as an efficient x-ray lithography source. In order to design a practical laser created x-ray source, it is necessary to study the factors affecting the x-ray emission. For this purpose, we investigate both theoretically and experimentally the influence of the laser target parameters on the x-ray emission in different spectral ranges for two laser wavelengths (λ=1.06 μm, λ=0.26 μm). From these results and considering mask transmission, resist sensitivities, and wafer throughput, we establish the characteristics of the laser required as an x-ray lithography source with performance acceptable for industrial applications.