Effective diffusion time during rapid thermal processing
- 1 February 1987
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 61 (3) , 1209-1210
- https://doi.org/10.1063/1.338169
Abstract
A simple, readily applicable expression is derived for the effective diffusion time during the shortest possible rapid thermal processing cycle in halogen lamps heated furnaces for processing solid state devices. Calculations, using the derived expression, indicate that the shortest effective diffusion time at the maximum attained temperature is in the neighborhood of 1 s, even though there is no actual hold time at this temperature.This publication has 4 references indexed in Scilit:
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