Magnetic Domains in Thin Sputtered FeSi Films. I. Edge Effects and Influence of the Substrate Temperature and the Ar Pressure during Sputtering
- 16 February 1975
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 27 (2) , 413-427
- https://doi.org/10.1002/pssa.2210270212
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- Observation of a new domain configuration in polycrystalline FeSi filmsApplied Physics Letters, 1973
- The use of sputtered conductor materials in film integrated circuitsThin Solid Films, 1972
- Closed-flux elements for integrated magnetic memoriesIEEE Transactions on Magnetics, 1972
- Some factors in the easy axis magnetization of permalloy filmsPhilosophical Magazine, 1964
- Magnetic Thin Films Prepared by SputteringJournal of Applied Physics, 1961
- The Influence of Edge Effects on Domain Structure and Coercive Force of Circular Nickel-Iron Films [Letter to the Editor]IBM Journal of Research and Development, 1960
- Domain patterns and reversals by wall movements of thin films of iron and nickel ironJournal de Physique et le Radium, 1959
- Magnetic Domain Patterns on Thin FilmsJournal of Applied Physics, 1957
- Magnetic Domains in Evaporated Thin Films of Nickel-IronPhysical Review B, 1956