Measurement of the interlayer between aluminum and silicon dioxide using ellipsometric, capacitance-voltage and auger electron spectroscopy techniques
- 1 August 1981
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 82 (2) , 183-193
- https://doi.org/10.1016/0040-6090(81)90442-9
Abstract
No abstract availableKeywords
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