X ray study of the atomic structure of amorphous hydrogenated silicon and germanium
- 29 February 1980
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 35-36, 507-511
- https://doi.org/10.1016/0022-3093(80)90645-6
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Hydrogen content and density of plasma-deposited amorphous silicon-hydrogenJournal of Applied Physics, 1979
- X-ray diffraction study of the effect of hydrogen atoms on the Si–Si atomic short-range order in amorphous siliconPhysica Status Solidi (a), 1979