A model for boron short time annealing after ion implantation
- 1 July 1993
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 40 (7) , 1215-1222
- https://doi.org/10.1109/16.216424
Abstract
No abstract availableThis publication has 22 references indexed in Scilit:
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