Determination of Epitaxial-Layer Impurity Distribution by Neutron Activation Method
- 1 January 1965
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 4 (1)
- https://doi.org/10.1143/jjap.4.70
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- On the Distribution of Impurities in Epitaxial Silicon FilmsJapanese Journal of Applied Physics, 1964
- A Three-Point Probe Method for Electrical Characterization of Epitaxial FilmsJournal of the Electrochemical Society, 1964
- Impurity Distribution in Epitaxial Silicon FilmsJournal of the Electrochemical Society, 1962
- Anomalous Impurity Diffusion in Epitaxial Silicon near the SubstrateJournal of the Electrochemical Society, 1962
- Epitaxial Silicon Films by the Hydrogen Reduction of SiCl[sub 4]Journal of the Electrochemical Society, 1961