Anisotropic boron diffusion in silicon under oxidizing atmospheres

This publication has 5 references indexed in Scilit:

• Orientation dependence of the diffusion of boron in silicon
  Solid-State Electronics, 1971
• The Orientation Dependence of Boron Diffusion
  Japanese Journal of Applied Physics, 1970
• The orientation dependent diffusion of boron in silicon under oxidizing conditions
  Solid-State Electronics, 1969
• The base diffusion profile arising from boron redistribution in the oxide—a useful approximation
  Solid-State Electronics, 1965
• Redistribution of Diffused Boron in Silicon by Thermal Oxidation
  Japanese Journal of Applied Physics, 1964