Low Temperature Deposition of Polycrystalline Silicon thin Films by Hot-Wire CVD
- 1 January 1995
- journal article
- Published by Springer Nature in MRS Proceedings
- Vol. 377, 69
- https://doi.org/10.1557/proc-377-69
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Hall Mobility of Low-Temperature-Deposited Polysilicon Films by Catalytic Chemical Vapor Deposition MethodJapanese Journal of Applied Physics, 1994
- Hot filament assisted deposition of silicon nitride thin filmsApplied Physics Letters, 1992
- The Low Temperature Catalyzed Chemical Vapor Deposition and Characterization of Silicon Nitride Thin FilmsJournal of the Electrochemical Society, 1992
- Deposition of device quality, low H content amorphous siliconJournal of Applied Physics, 1991
- Investigation of the precursors of a-Si:H films produced by decomposition of silane on hot tungsten surfacesJournal of Non-Crystalline Solids, 1991
- Study on catalytic chemical vapor deposition method to prepare hydrogenated amorphous siliconJournal of Applied Physics, 1989
- Production of high-quality amorphous silicon films by evaporative silane surface decompositionJournal of Applied Physics, 1988
- Photochemistry of silicon compounds. IV. Mercury photosensitization of disilaneJournal of the American Chemical Society, 1973