Ion energy and angular distributions at the anode of RF etch reactors
- 1 November 1991
- journal article
- Published by IOP Publishing in Journal of Physics: Condensed Matter
- Vol. 3 (S) , S257-S264
- https://doi.org/10.1088/0953-8984/3/s/040
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Ion energy distributions in radio-frequency dischargesJournal of Applied Physics, 1991
- Electrical potentials in RF dischargesJournal of Physics D: Applied Physics, 1990
- Ion energy measurement at the powered electrode in an rf dischargeJournal of Applied Physics, 1988