Photo-Assisted Metalorganic Chemical Vapor Deposition of Zinc Oxide Thin Films

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Abstract
Zinc oxide thin films were obtained from dimethylzinc and carbon dioxide or oxygen by the metalorganic chemical vapor deposition method. A low-pressure mercury lamp was used to assist the deposition of films. At a substrate temperature above 200°C, c-axis-oriented polycrystalline thin films were obtained. The deposition rate of the thermally grown films strongly depended on the configuration of the reactor, and effects of photo-irradiation on the deposition rate also changed according to the configuration of the reactor. In a horizontal reactor, the deposition rate actually decreased upon irradiation.