New physical model of multiplication-induced breakdown in MOSFETs
- 30 November 1991
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 34 (11) , 1297-1307
- https://doi.org/10.1016/0038-1101(91)90071-6
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- The voltage-doping transformation: a new approach to the modeling of MOSFET short-channel effectsIEEE Electron Device Letters, 1988
- A circuit simulation model for bipolar-induced breakdown in MOSFETIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, 1988
- Short-channel MOS transistors in the avalanche-multiplication regimeIEEE Transactions on Electron Devices, 1982
- An accurate large-signal MOS transistor model for use in computer-aided designIEEE Transactions on Electron Devices, 1972
- Carrier multiplication in the pinchoff region of m.o.s. transistorsElectronics Letters, 1971