A simple and new modified CVD technique for fabrication of SnO2films
- 14 October 1990
- journal article
- Published by IOP Publishing in Journal of Physics D: Applied Physics
- Vol. 23 (10) , 1324-1326
- https://doi.org/10.1088/0022-3727/23/10/010
Abstract
Thin polycrystalline films of tin dioxide, SnO2, were prepared by a new modification of the chemical vapour deposition (CVD) method. Some electrical and optical properties of SnO2 films were determined as a function of the deposition conditions and doping by antimony (Sb). Attempts have been made to find the optimum deposition parameters which give SnO2 films with good optoelectronic properties, high electrical conductivity, large IR reflectance and at the same time high optical transmittance in the visible regionKeywords
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