Photoreflectance characterization of surface Fermi level in as-grown GaAs(100)

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Abstract
Photoreflectance (PR) spectroscopy has been used to study the surface Fermi level in GaAs by taking account of photovoltaic properties at the semiconductor surface. The PR signal amplitude ‖ΔR/R‖ is proportional to a modulating photovoltage Vm generated by a modulation light irradiation. To modify the surface potential, the sample was irradiated by a third perturbing light, i.e., a continuous bias light Pb, together with the modulation light. The modulation light power dependence of ‖ΔR/R‖ is extremely sensitive to bias light intensity, surface Fermi level, and temperature. From the analysis of the temperature dependence of ‖ΔR/R‖ on modulation‐light power, the surface Fermi level of 0.47±0.09 eV below the conduction band was determined for a molecular beam epitaxially‐grown GaAs(100).