Low‐temperature structural relaxation in poly(alkyl methacrylate)s and related polymers probed by photochemical hole burning
- 1 December 1996
- journal article
- Published by Wiley in Macromolecular Chemistry and Physics
- Vol. 197 (12) , 4095-4103
- https://doi.org/10.1002/macp.1996.021971210
Abstract
No abstract availableKeywords
This publication has 20 references indexed in Scilit:
- Photochemical hole burning of organic dye doped in inorganic semiconductorApplied Physics Letters, 1995
- Photochemical hole burning of tetraphenylporphine derivatives: relationship between the quantum efficiency for hole formation and chemical structure of tetraphenylporphine derivativesChemistry of Materials, 1993
- Photon-gated photochemical hole burning by two-color sensitization of a photoreactive polymer via triplet-triplet energy transferApplied Physics Letters, 1992
- Photochemical hole burning of tetraphenylporphin in an aromatic polyimidePolymer, 1991
- Photochemical hole burning (PHB) of tetraphenylporphin in poly(ethylene terephthalate)Polymer, 1991
- High-temperature photochemical hole burning and laser-induced hole filling in dye-doped polymer systemsThe Journal of Chemical Physics, 1991
- Photochemical hole burning of tetraphenylporphin in epoxy resin: Effect of crosslinked structureApplied Physics Letters, 1990
- Photochemical hole burning of tetraphenylporphin in phenoxy resin at 4.2–80 KJournal of Applied Physics, 1989
- Temperature Dependence of PHB Hole Profiles in Polymer MatricesJapanese Journal of Applied Physics, 1988
- Methyl Group Tunneling and Viscoelastic Relaxation in Poly(methyl methacrylate)Macromolecules, 1978