The production of titania thin film waveguides by dc reactive magnetron sputtering
- 1 January 1992
- Vol. 43 (1-2) , 143-147
- https://doi.org/10.1016/0042-207x(92)90201-7
Abstract
No abstract availableThis publication has 10 references indexed in Scilit:
- Optimizing deposition parameters of electron beam evaporated TiO_2 filmsApplied Optics, 1988
- Contamination analysis of TiO2 thin films deposited using ion assisted depositionNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1985
- Properties of TiO_2 and SiO_2 thin films deposited using ion assisted depositionApplied Optics, 1985
- Reactive ion plating of TiO2Vacuum, 1984
- Ion-beam-assisted deposition of thin filmsApplied Optics, 1983
- Reactive high rate sputtering of oxidesThin Solid Films, 1981
- Influence of deposition parameters on the optical and structural properties of TiO2 films produced by reactive d.c. plasmatron sputteringThin Solid Films, 1981
- Features of and IN SITU measurements on absorbing TiOx films produced by reactive d.c. magnetron-plasmatron sputteringThin Solid Films, 1980
- Attenuation in thin film optical waveguides due to roughness-induced mode couplingThin Solid Films, 1978
- Optical waveguide modes in single-crystalline LiNbO3–LiTaO3 solid-solution filmsApplied Physics Letters, 1974