Growth of ZnSe/ZnS strained-layer superlattices on Si substrates
- 15 November 1988
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 64 (10) , 5201-5205
- https://doi.org/10.1063/1.342432
Abstract
The high-quality ZnSe-ZnS strained-layer superlattices (SLSs), as well as the ZnS layers, were successfully grown for the first time on Si substrates. Photoluminescence (PL) spectra of ZnS layers grown on Si showed an intense excitonic-emission line. In transmission electron microscopy analyses, no misfit dislocations and no moiré fringes were observed on the ZnS layer with a thickness of less than about 500 Å. We have also characterized ZnSe-ZnS SLSs grown on Si substrates. By the PL measurements, an intense excitonic-emission line, and no emissions due to deep levels, were observed. As the ZnSe well-layer thickness decreased, the peak of the line largely shifted towards the higher-energy side. This behavior may be related to the quantum size effect. In the temperature dependence of PL intensity, there appeared the thermal quenching process, which may be related to the thermal release of excitons in quantum wells. As the thickness of the ZnSe well-layer decreased, the activation energy abruptly increased at a ZnSe thickness of less than the three-dimensional exciton Bohr radius in bulk ZnSe. It is proposed that the dependence of the activation energy is due to the two-dimensional exciton behavior in quantum wells.This publication has 15 references indexed in Scilit:
- Structural properties of the ZnSe/GaAs system grown by molecular-beam epitaxyJournal of Applied Physics, 1988
- Room-temperature continuous operation of p-n AlxGa1−xAs-GaAs quantum well heterostructure lasers grown on SiApplied Physics Letters, 1987
- Low-threshold operation of AlGaAs/GaAs multiple quantum well lasers grown on Si substrates by molecular beam epitaxyApplied Physics Letters, 1987
- Degradation of GaAs lasers grown by metalorganic chemical vapor deposition on Si substratesApplied Physics Letters, 1987
- Polar-on-nonpolar epitaxyJournal of Crystal Growth, 1987
- Epitaxial Growth of ZnS on Si by Metal Organic Chemical Vapor DepositionJapanese Journal of Applied Physics, 1985
- Calculation of critical layer thickness versus lattice mismatch for GexSi1−x/Si strained-layer heterostructuresApplied Physics Letters, 1985
- Coherent Growth of ZnSe on GaAs by MOCVDJapanese Journal of Applied Physics, 1985
- Epitaxial growth of high quality ZnSe on Si substrates by molecular beam epitaxy and application to dc electroluminescent cellsJournal of Applied Physics, 1985
- Characterization of epitaxially grown GaAs on Si substrates with III-V compounds intermediate layers by metalorganic chemical vapor depositionJournal of Applied Physics, 1985