N2-plasma-nitridation effects on porous silicon

This publication has 8 references indexed in Scilit:

• NH₃-Plasma-Nitridation Process of (100) GaAs Surface Observed by Angle-Dependent X-Ray Photoelectron Spectroscopy
  Japanese Journal of Applied Physics, 1995
• Luminescent Characteristics of Plasma-Oxidized Porous Silicon
  Japanese Journal of Applied Physics, 1994
• Ultrathin SiO2 films on Si formed by N2O-plasma oxidation technique
  Applied Surface Science, 1994
• Nature of electron spin resonance centers in porous silicon
  Journal of Non-Crystalline Solids, 1993
• Spectroscopic Study on N₂O-Plasma Oxidation of Hydrogenated Amorphous Silicon and Behavior of Nitrogen
  Japanese Journal of Applied Physics, 1993
• Electron Spin Resonance Centers and Light-Induced Effects in Porous Silicon
  Japanese Journal of Applied Physics, 1993
• Novel oxidation process of hydrogenated amorphous silicon utilizing nitrous oxide plasma
  Applied Physics Letters, 1992
• Oxidation of silicon (oxy)nitride and nitridation of silicon dioxide: Manifestations of the same chemical reaction system?
  Thin Solid Films, 1990