Crystallographic Aspects of Low Energy Boron Implantation Into Silicon
- 1 January 1988
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
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- Channeling in low energy boron ion implantationApplied Physics Letters, 1984
- Computer simulation of atomic-displacement cascades in solids in the binary-collision approximationPhysical Review B, 1974
- Channeling and related effects in the motion of charged particles through crystalsReviews of Modern Physics, 1974
- THE CHANNELING OF ENERGETIC ATOMS IN CRYSTAL LATTICESApplied Physics Letters, 1963