Annealing and oxidation effects after CF4/H2 dry etching for damage recovery
- 1 July 1986
- journal article
- Published by Elsevier in Surface Science
- Vol. 172 (3) , 763-772
- https://doi.org/10.1016/0039-6028(86)90511-x
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
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