Properties of Crn and (Ti, Al)N Coatings Produced by High Rate Sputter Deposition
- 1 January 1987
- journal article
- Published by SAGE Publications in Surface Engineering
- Vol. 3 (1) , 47-52
- https://doi.org/10.1179/sur.1987.3.1.47
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
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- Preparation of titanium nitride by a pulsed d.c. magnetron reactive deposition techniques using the moving mode of depositionThin Solid Films, 1980
- Applications of wear-resistant thick films formed by physical vapor deposition processesThin Solid Films, 1977
- Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatingsJournal of Vacuum Science and Technology, 1974
- Structure and properties of sputtered titanium carbide and titanium nitride coatingsJournal of Vacuum Science and Technology, 1974