Thermal stability of silicon nitride coatings produced by ion assisted deposition
- 1 March 1989
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 39 (1-4) , 190-193
- https://doi.org/10.1016/0168-583x(89)90769-6
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- Ion beam assisted deposition of substoichiometric silicon nitrideNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1987
- Characterization of buried silicon-nitride formed by nitrogen implantationNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1987
- Characterization of a 3 cm Kaufman ion source with nitrogen feed gasVacuum, 1986
- Refractive index profiles and range distributions of silicon implanted with high-energy nitrogenJournal of Applied Physics, 1979
- Characterization of Silicon Nitride FilmsJournal of the Electrochemical Society, 1971