Influence of substrate temperature and post-deposition heat treatment on the optical properties of SiO2 films
- 15 March 1989
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 170 (2) , 179-184
- https://doi.org/10.1016/0040-6090(89)90722-0
Abstract
No abstract availableKeywords
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