Effects of substrate temperatures on vacuum deposited thin films of silicon monoxide
- 1 February 1973
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 15 (2) , S17-S19
- https://doi.org/10.1016/0040-6090(73)90051-5
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- A Nondestructive Measurement of Thickness and Composition of Thin Silicon Oxide FilmsJournal of Vacuum Science and Technology, 1972
- Analysis of a Ring Cavity Thin-Film Deposition SourceJournal of Vacuum Science and Technology, 1970
- The evaluation of thin film insulatorsThin Solid Films, 1968
- Stress in films of silicon monoxideBritish Journal of Applied Physics, 1967
- Properties of Evaporated Thin Films of SiOJournal of the Electrochemical Society, 1963