Simple Direct Monitoring of SiH3Radical and Particulates in a Silane Plasma with Ultraviolet Transmission Spectroscopy
- 1 April 1995
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 34 (4A) , L448
- https://doi.org/10.1143/jjap.34.l448
Abstract
The silyl radical ( SiH3) in a H2/SiH4 rf plasma is successfully detected by an easy and inexpensive method, i.e., high-sensitivity ultraviolet transmission spectroscopy (UVTS). The diffusive absorption band of the SiH3 radical is observed in the 205-240 nm region. The relative SiH3 density is measured as a function of RF power from 20 to 100 mW/ cm2 by UVTS. The UV transmittance is very sensitive to particulates in the plasma, thus enabling both particulates and SiH3 radicals to be monitored simultaneously.Keywords
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