The Growth of Silicon Oxide Films by Remote Plasma Enhanced CVD

This publication has 11 references indexed in Scilit:

• Deposition of silicon oxynitride thin films by remote plasma enhanced chemical vapor deposition
  Journal of Vacuum Science & Technology A, 1987
• Deposition of silicon dioxide and silicon nitride by remote plasma enhanced chemical vapor deposition
  Journal of Vacuum Science & Technology A, 1986
• Deposition of Dielectric Films by Remote Plasma Enhanced CVD
  MRS Proceedings, 1986
• IR absorption in glow-discharge-deposited $a-\mathrm{S}\mathrm{i}:(\mathrm{D},\mathrm{O})$ and $a-\mathrm{S}\mathrm{i}:(\mathrm{D},\mathrm{N})$ alloy films
  Physical Review B, 1984
• Indirect plasma deposition of silicon dioxide
  Journal of Vacuum Science and Technology, 1982
• Electronic and structural properties of plasma-deposited a-Si:O:H - The story of O2
  Journal of Non-Crystalline Solids, 1980
• Chemical effects on the frequencies of Si-H vibrations in amorphous solids
  Solid State Communications, 1979
• R.F. plasma deposition of silicon nitride layers
  Thin Solid Films, 1978
• Free-radical chain formation of siloxanes in the radiolysis of monosilane-nitric oxide mixtures
  The Journal of Physical Chemistry, 1977
• Spectres de vibration du trimethylsilanol
  Spectrochimica Acta Part A: Molecular Spectroscopy, 1973