The effect of composition and sheet resistance on the strain sensitivity of Cr-SiO cermet films

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Abstract
Reports the effect of composition and sheet resistance on the gauge factor and temperature coefficient of resistance of thin Cr-SiO cermet films. The films were deposited onto smooth glass microscope slides using both flash evaporation and RF sputtering. The measured gauge factor and temperature coefficient of resistance is shown to increase with decreasing chromium content. A monatonic relationship between the measured gauge factor and temperature coefficient of resistance is established. The composition of the deposition films has been analysed as a function of depth using Auger electron spectroscopy. The composition of the deposited films is shown to consist of chromium, elemental silicon, silicon oxide of differing stoichiometry together with other oxides formed during deposition.