Measurements of Plasma Controlled by Compressed Magnetic Field Magnetron Sputtering Technique
- 1 May 1993
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 32 (5R)
- https://doi.org/10.1143/jjap.32.2112
Abstract
Measurements of the electron density of plasma and the magnetic field were carried out in a compressed magnetic field-magnetron sputtering system using a non-ferromagnetic material target. The electron density has its maximum in the region where the lines of magnetic force are parallel to the target surface, where the peak of erosion profile is observed. It was found that the peak position of the profiles of electron density and erosion could be controlled using this system.Keywords
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