Influence of sputtering pressure on the properties of hydrogenated amorphous-silicon carbon alloy films prepared by magnetron sputtering of silicon in methane-argon gas mixtures
- 1 April 1986
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 59 (7) , 2498-2502
- https://doi.org/10.1063/1.336995
Abstract
No abstract availableThis publication has 21 references indexed in Scilit:
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