Activation Volume for Hf Diffusion in an Amorphous NZAlloy
- 27 January 1997
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 78 (4) , 697-700
- https://doi.org/10.1103/physrevlett.78.697
Abstract
In this Letter we present the results of a diffusion study of Hf in a NZ amorphous alloy. We have measured the diffusion properties with and without pressure, up to 1 GPa. From these measurements we can deduce an Arrhenius behavior of the diffusion, with an activation energy of 0.76 eV and a pre-exponential factor of . The activation volume amounts to 8.5 . Activation volume and energy are related by the Keyes relationship. We then discuss to what extent presently proposed diffusion mechanisms, point defects, or collective processes can be tested against these results.
Keywords
This publication has 16 references indexed in Scilit:
- Molecular-dynamics study of the glass transition in a binary soft-sphere modelPhysical Review A, 1991
- Fe-enhancement of self-diffusion in α-ZrJournal of Nuclear Materials, 1991
- Pressure dependence and isotope effect of self-diffusion in a metallic glassPhysical Review Letters, 1990
- Activation volume for diffusion in a metallic glassActa Metallurgica et Materialia, 1990
- Unified analysis of diffusion and relaxation processes in amorphous metallic alloysRadiation Effects and Defects in Solids, 1989
- Nouveau mécanisme de diffusion dans les solides à haute températurePhilosophical Magazine A, 1987
- Study of Point Defects in Non Crystalline Alloys by High Temperature Mass Transport ExperimentsMaterials Science Forum, 1987
- The anomalous self-diffusion in α-ZrJournal of Nuclear Materials, 1985
- Anomalous self-diffusion in a single crystal of α-zirconiumJournal of Nuclear Materials, 1984
- Thermal stability and electronic properties of amorphous Zr-Co and Zr-Ni alloysPhysical Review B, 1979