Ion implantation doping of polycrystalline SiC thin films prepared by PECVD
- 1 January 1993
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 80-81, 927-930
- https://doi.org/10.1016/0168-583x(93)90711-e
Abstract
No abstract availableKeywords
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