Change in Film Stress of a-Si:H by Annealing
- 1 January 1986
- journal article
- Published by Japan Institute of Metals in Transactions of the Japan Institute of Metals
- Vol. 27 (10) , 789-790
- https://doi.org/10.2320/matertrans1960.27.789
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
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