Polydiacetylene Monolayers as Versatile Photoresists for Interfacial Patterning
- 7 June 2000
- journal article
- Published by American Chemical Society (ACS) in Langmuir
- Vol. 16 (14) , 5998-6003
- https://doi.org/10.1021/la000178z
Abstract
No abstract availableKeywords
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